ONE AND J. Gallery is proud to participate in Expo Chicago 2018 (Booth 325).
The gallery will be presenting the work of four artists based in Seoul, Korea.
Taeyoon Kim's practice centres on the materialisation of data and how technology has affected the artists' practice. Oscillations of data particles generate an infinite feedback via the creation of new links and relationships as bits of information are transformed by our acceptance and sharing. We will show sculptural works created by the collection of data culled from the Internet then inputted into software controlling the three dimensional shape taking into account systemic glitches.
Seung Yul Oh manipulates everyday objects in their surroundings and releases the new object into the space without its original utilitarian function. This re-contextualization disrupts conventional modes of thinking and creates new and unique aesthetic experiences. The gallery will present paintings from his Lean series consisting of lines that playfully interact in a seemingly random way but creating balance to the composition.
Minha Park's works are focused on the effects of light on various environments such as sunsets, fields, and bodily phenomena. Rather than a simple reproduction, the works exist in an alternate condition within the original space. In order to affect these changes, Park uses a different array of colours that adds to the other worldly yet familiar feel of the paintings creating a co-habituating offbeat tension.
Dongwook Suh's works have a symbiotic relationship and are explorations of temporal shifts and memory. The portrayal of subjects waiting for salvation in the past intersects with moments in the present though in ways that do not totally correspond. Because of this continuing and incomplete interaction, new stories develop as reflected in both his film work and the continuation of unfinished narratives in the accompanying paintings.